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Conformal SiO₂ coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition

Sobel, Nicolas ; Hess, Christian ; Lukas, Manuela ; Spende, Anne ; Stühn, Bernd ; Toimil-Molares, Maria Eugenia ; Trautmann, Christina (2024)
Conformal SiO₂ coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition.
In: Beilstein Journal of Nanotechnology, 2015, 6
doi: 10.26083/tuprints-00026767
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Item Type: Article
Type of entry: Secondary publication
Title: Conformal SiO₂ coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
Language: English
Date: 24 April 2024
Place of Publication: Darmstadt
Year of primary publication: 2015
Place of primary publication: Frankfurt, M.
Publisher: Beilstein-Institut
Journal or Publication Title: Beilstein Journal of Nanotechnology
Volume of the journal: 6
DOI: 10.26083/tuprints-00026767
Corresponding Links:
Origin: Secondary publication service
Abstract:

Polycarbonate etched ion-track membranes with about 30 µm long and 50 nm wide cylindrical channels were conformally coated with SiO₂ by atomic layer deposition (ALD). The process was performed at 50 °C to avoid thermal damage to the polymer membrane. Analysis of the coated membranes by small angle X-ray scattering (SAXS) reveals a homogeneous, conformal layer of SiO₂ in the channels at a deposition rate of 1.7–1.8 Å per ALD cycle. Characterization by infrared and X-ray photoelectron spectroscopy (XPS) confirms the stoichiometric composition of the SiO₂ films. Detailed XPS analysis reveals that the mechanism of SiO₂ formation is based on subsurface crystal growth. By dissolving the polymer, the silica nanotubes are released from the ion-track membrane. The thickness of the tube wall is well controlled by the ALD process. Because the track-etched channels exhibited diameters in the range of nanometres and lengths in the range of micrometres, cylindrical tubes with an aspect ratio as large as 3000 have been produced.

Uncontrolled Keywords: atomic layer deposition (ALD), ion-track technology, nanochannels, polycarbonate, silica (SiO2), small angle X-ray scattering (SAXS), track-etched channels, X-ray photoelectron spectroscopy (XPS)
Status: Publisher's Version
URN: urn:nbn:de:tuda-tuprints-267678
Classification DDC: 500 Science and mathematics > 530 Physics
500 Science and mathematics > 540 Chemistry
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Ion-Beam-Modified Materials
05 Department of Physics > Institute for condensed matter physics (2021 merged in Institute for Condensed Matter Physics) > Experimental Condensed Matter Physics
07 Department of Chemistry > Eduard Zintl-Institut > Physical Chemistry
Date Deposited: 24 Apr 2024 12:23
Last Modified: 07 Aug 2024 11:31
URI: https://tuprints.ulb.tu-darmstadt.de/id/eprint/26767
PPN: 520338138
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