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In this work, wavelengths were determined for the robust and simultaneous measurement of film thickness, urea concentration and fluid temperature. Film parameters such as film thickness, film temperature and the composition of the film are typically dynamically and interdependently changing. To gain knowledge of these quantities, a measurement method is required that offers a high temporal resolution while being non-intrusive so as to not disturb the film as well as the process conditions. We propose the extension of the FMLAS method, which was previously validated for the film thickness measurement of thin liquid films, to determine temperatures and concentrations using an adapted evaluation approach.

This article belongs to the Special Issue Diode Laser Spectroscopy – Robust Sensing for Environmental and Industrial Applications

Keywords: laser diagnostic; spectroscopy; film thickness; selective catalytic reduction