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Reactive magnetron sputtering of Cu₂O: Dependence on oxygen pressure and interface formation with indium tin oxide

Deuermeier, Jonas ; Gassmann, Jürgen ; Brötz, Joachim ; Klein, Andreas (2021)
Reactive magnetron sputtering of Cu₂O: Dependence on oxygen pressure and interface formation with indium tin oxide.
In: Journal of Applied Physics, 2011, 109 (11)
doi: 10.26083/tuprints-00019938
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Item Type: Article
Type of entry: Secondary publication
Title: Reactive magnetron sputtering of Cu₂O: Dependence on oxygen pressure and interface formation with indium tin oxide
Language: English
Date: 2021
Place of Publication: Darmstadt
Year of primary publication: 2011
Publisher: AIP Publishing
Journal or Publication Title: Journal of Applied Physics
Volume of the journal: 109
Issue Number: 11
Collation: 7 Seiten
DOI: 10.26083/tuprints-00019938
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Origin: Secondary publication service
Abstract:

Thin films of copper oxides were prepared by reactive magnetron sputtering and structural, morphological, chemical, and electronic properties were analyzed using x-ray diffraction, atomic force microscopy, in situ photoelectron spectroscopy, and electrical resistance measurements. The deposition conditions for preparation of Cu(I)-oxide (Cu₂O) are identified. In addition, the interface formation between Cu₂O and Sn-doped In2O3 (ITO) was studied by stepwise deposition of Cu₂O onto ITO and vice versa. A type II (staggered) band alignment with a valence band offset.

Status: Publisher's Version
URN: urn:nbn:de:tuda-tuprints-199383
Classification DDC: 500 Science and mathematics > 530 Physics
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Surface Science
11 Department of Materials and Earth Sciences > Material Science > Structure Research
DFG-Collaborative Research Centres (incl. Transregio) > Collaborative Research Centres > CRC 595: Electrical fatigue > D - Component properties > Subproject D3: Function and fatigue of oxide electrodes in organic light emitting diodes
Date Deposited: 17 Nov 2021 13:22
Last Modified: 02 Feb 2023 09:08
URI: https://tuprints.ulb.tu-darmstadt.de/id/eprint/19938
PPN: 504218425
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