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  5. 12% efficient CdTe/CdS thin film solar cells deposited by low-temperature close space sublimation
 
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2011
Zweitveröffentlichung
Artikel
Verlagsversion

12% efficient CdTe/CdS thin film solar cells deposited by low-temperature close space sublimation

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20-1.3639291.pdf
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TUDa URI
tuda/7692
URN
urn:nbn:de:tuda-tuprints-198886
DOI
10.26083/tuprints-00019888
Autor:innen
Schaffner, Judith
Motzko, Markus
Tueschen, Alexander
Swirschuk, Andreas
Schimper, Hermann-Josef
Klein, Andreas ORCID 0000-0001-7463-1495
Modes, Thomas
Zywitzki, Olaf
Jaegermann, Wolfram
Kurzbeschreibung (Abstract)

We report 12% efficient CdS/CdTe thin film solar cells prepared by low temperature close space sublimation (CSS). Both semiconductor films, CdS and CdTe, were deposited by high vacuum CSS in superstrate configuration on glass substrates with fluorine doped tin oxide (FTO) front contact. The CdTe deposition was carried out at a substrate temperature (Tsub) of 340° C, which is much lower than that used in conventional processes (>500° C). The CdTe films were treated with the usual CdCl2 activation process. Different optimal annealing times and temperatures were found for low-temperature cells (Tsub 340° C) compared to high-temperature cells (Tsub ¼ 520° C). The influence of the activation step on the morphology of high-temperature and low-temperature CdTe is determined by XRD, AFM, SEM top views, and SEM cross-sections. Grain growth, strong recrystallization, and a reduction of planar defects during the activation step are observed, especially for low-temperature CdTe. Further, the influence of CdS deposition parameters on the solar cell performance is investigated by using three different sets of parameters with different deposition rates and substrate temperatures for the CdS preparation. Efficiencies about 10.9% with a copper-free back contact and 12.0% with a copper-containing back contact were achieved using the low temperature CdTe process.

Sprache
Englisch
Fachbereich/-gebiet
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung
DDC
500 Naturwissenschaften und Mathematik > 530 Physik
Institution
Universitäts- und Landesbibliothek Darmstadt
Ort
Darmstadt
Titel der Zeitschrift / Schriftenreihe
Journal of Applied Physics
Jahrgang der Zeitschrift
110
Heftnummer der Zeitschrift
6
ISSN
1077-3118
Verlag
AIP Publishing
Publikationsjahr der Erstveröffentlichung
2011
Verlags-DOI
10.1063/1.3639291
PPN
503965464
Zusätzliche Links (Verlag)
https://aip.scitation.org/journal/apl

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